Low differential pressure mass flow controller with a minimum operating differential pressure of 800 Pa.
Uniquely developed ambient temperature compensated sensor low pressure loss specification and ±1% F.S. accuracy reduces pressure loss.
Unique piezo actuator valve provides accurate flow control and stability at low differential pressure.
- Low differential pressure (800 Pa)
- Operating temperature 5 to 50°C
- Metal seal
- Clean (particle guarantee)
- Ambient temperature compensated sensor
- RS-485 communication
- Micro flow F.S.
Examples of Use
Flow control at low vapor pressure gas low temperature
MC-3000S is a low differential pressure mass flow controller with a proprietary low pressure drop structure that enables flow control of liquid materials such as H2O at room temperature as long as the secondary side is under vacuum. It is recommended for the ITO sputtering method, etc., where a small amount of water vapor is sent to a vacuum chamber. Flow control is also possible at room temperature for solid materials with low vapor pressure, such as XeF2.
Flow control of reduced pressure tank vessels (SDS vessels)
Ion implanter uses special material gases such as AsH3 and PH3, which are often supplied by Safe Delivery Source (SDS) containers for safe and stable supply. The MC-3000S has a unique low pressure drop structure that enables flow control at a minimum differential pressure of 800 Pa (6 Torr).
|Flow rate in Nitrogen(Full scale)||2 ～ 10SCCM||～ 20SCCM||～ 30SCCM|
|Flow rate control range||2 ～ 100% F.S.|
|Operating differential pressure||8×102Pa ～ 1.33×105Pa||1.07×103Pa ～ 1.33×105Pa||1.33×103Pa ～ 1.33×105Pa|
|Temperature||5 ～ 50℃|